FACILITY PARTS CLEANING SOLUTION FOR PROCESSING OF (METH)ACRYLIC ACID AND/OR (METH)ACRYLIC ESTERS AND CLEANING METHOD USING SAID CLEANING SOLUTION

摘要

The present invention relates to a facility parts cleaning solution for the processing of (meth)acrylic acid and/or (meth)acrylic esters and a cleaning method using the cleaning solution. An aqueous cleaning composition comprising 5 to 50 wt% of at least one alkali metal hydroxide selected from the group consisting of sodium hydroxide and potassium hydroxide, 0.01 to 1 wt% of a water-soluble amino acid, 0.001 to 0.05 wt% of N.N'-methylene bisacrylamide, and 0.001 to 0.05 wt% of azobisisobutyronitrile is used to clean facility parts for manufacturing (meth)acrylic acid and/or (meth)acrylic esters in order to easily remove polymers and deposits.