| 摘要 |
PROBLEM TO BE SOLVED: To improve a multi-beam exposure device for performing multi-beam scanning. SOLUTION: The multi-beam exposure device 1 comprisesΣ(Ni-1) half mirrors 11 for combiningΣNi lines of light beams into M lines of light beam groups, M groups of finite lenses 8, provided with a positive power of which the absolute value is large, in the vertical scanning direction for converging then further as compared with the horizontal scanning direction; a combination purpose reflecting mirror 13 for reflecting the M lines of light beam groups to be almost overlapped over each other in a 1st direction, a deflection device 5 for deflecting the combined M lines of light beam groups; and a dust protective glass 14 tilted in the direction opposite to the direction in which the half mirrors are tilted, and the influence of coma aberrations on the M lines of light beam groups can be reduced by the half mirrors. COPYRIGHT: (C)2006,JPO&NCIPI
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