| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for recycling an exposure mask comprising synthetic quartz glass becoming a disposal object in the semiconductor manufacturing industry though kept excellent in dynamic physical properties, dimensional stability, heat resistance, flame retardancy and the like. SOLUTION: The exposure mask for manufacturing a semiconductor is washed (washing process) and it is inspected whether the washed exposure mask is usable (inspection process). If the washed exposure mask is out of a desired precision, the exposure mask for manufacturing the semiconductor comprising the synthetic quartz glass 1 is molded as the base raw material of a micromachine or a biochip (molding process). COPYRIGHT: (C)2006,JPO&NCIPI
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