发明名称 ORGANOMETALLIC PRECURSOR COMPOUNDS
摘要 This invention relates to organometallic precursor compounds represented by the formula i-PrN=Ta(NR1R2)3 wherein R1 and R2 are the same or different and are alkyl having from 1 to 3 carbon atoms, provided that (i) when R1 is ethyl, then R2 is other than ethyl and (ii) when R2 is ethyl, then R1 is other than ethyl, and a method for producing a film, coating or powder from the organometallic precursor compounds.
申请公布号 WO2005112101(A2) 申请公布日期 2005.11.24
申请号 WO2005US16053 申请日期 2005.05.09
申请人 PRAXAIR TECHNOLOGY, INC.;ZHANG, DELONG;HOOVER, CYNTHIA, A. 发明人 ZHANG, DELONG;HOOVER, CYNTHIA, A.
分类号 C07F9/00;C23C16/34;H01L21/285;H01L21/44;(IPC1-7):H01L21/44 主分类号 C07F9/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利