发明名称 SPATTERING TARGET AND METHOD OF MANUFACTURING THE SAME
摘要 <p>A spattering target used when a thin-film is manufactured by spattering and a method of manufacturing the spattering target. The spattering target comprises backing plates and a bonding material layer for sticking them to each other. A spacer is not present in the bonding material layer, the thickness of the bonding material layer is within the range of 0.25 to 2 mm, and the sticking surface of the target and the sticking surfaces of the backing plates are substantially kept parallel with each other.</p>
申请公布号 WO2005111261(A1) 申请公布日期 2005.11.24
申请号 WO2005JP08965 申请日期 2005.05.17
申请人 MITSUI MINING & SMELTING CO., LTD.;ONO, NAOKI 发明人 ONO, NAOKI
分类号 C23C14/34;H01J37/34;(IPC1-7):C23C14/34 主分类号 C23C14/34
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