发明名称 NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a negative resist composition having a high resolution and capable of reducing LWR. <P>SOLUTION: In the negative resist composition containing an alkali-soluble resin (A), an acid generator (B) which generates an acid upon irradiation with a radiation and a crosslinking agent (C), a compound (D) represented by formula (1) is contained. In the formula (1), R' and R" each independently represents a 1-5C alkyl; and p is 2 or 3. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005326580(A) 申请公布日期 2005.11.24
申请号 JP20040144042 申请日期 2004.05.13
申请人 TOKYO OHKA KOGYO CO LTD 发明人 HOJO TAKUMA;ISHIKAWA KIYOSHI
分类号 G03F7/004;G03F7/038;H01L21/027 主分类号 G03F7/004
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