发明名称 |
Thin film transistor substrate and fabrication method thereof |
摘要 |
The present invention provides a TFT substrate that includes a plurality of TFTs each of which have a gate, a source and a drain. The plurality of the TFTs may be formed by first and second active regions formed on the substrate that each have a source region that corresponds to a source and a drain region that corresponds to a drain. An offset region may be formed between the first and second active regions. A single contact hole may reach both the offset region and the adjacent source/drain regions of the first and second active regions.
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申请公布号 |
US2005258486(A1) |
申请公布日期 |
2005.11.24 |
申请号 |
US20050129393 |
申请日期 |
2005.05.16 |
申请人 |
YOON HAN-HEE |
发明人 |
YOON HAN-HEE |
分类号 |
H01L51/50;G09G3/30;H01L21/28;H01L21/768;H01L21/77;H01L21/84;H01L27/12;H01L29/417;H01L29/76;H01L29/786;H05B33/00;H05B33/14;(IPC1-7):H01L21/84 |
主分类号 |
H01L51/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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