发明名称 |
METHOD OF CONTROLLING THE DIFFERENTIAL DISSOLUTION RATE OF PHOTORESIST COMPOSITIONS |
摘要 |
<p>A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided.</p> |
申请公布号 |
EP1597629(A2) |
申请公布日期 |
2005.11.23 |
申请号 |
EP20040713722 |
申请日期 |
2004.02.23 |
申请人 |
PROMERUS, LLC |
发明人 |
RHODES, LARRY, F.;CHANG, CHUN;LANGSDORF, LEAH, J.;SIDAWAY, HOWARD, A.;ITO, HIROSHI |
分类号 |
G03F7/039;G03F7/30;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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