Lithographic appartus and device manufacturing method
摘要
An immersion lithographic apparatus includes a liquid supply system member (4) configured to contain a liquid (13) in a space between a projection system (PL) of the lithographic apparatus and the substrate (W) and a liquid supply system member compensator (2) arranged to compensate an interaction between the liquid supply system member (4) and substrate table (WT). <IMAGE>
申请公布号
EP1598706(A1)
申请公布日期
2005.11.23
申请号
EP20050253060
申请日期
2005.05.18
申请人
ASML NETHERLANDS B.V.
发明人
STREEFKERK, BOB;COX, HENRIKUS, HERMAN MARIE;HOOGENDAM, CHRISTIAAN ALEXANDER;MERTENS, JEROEN JOHANNES SOPHIA MARIA;ZAAL, KOEN JACOBUS JOHANNES MARIA;CUPERUS, MINNE