发明名称 |
Plasma processing apparatus and performance validation system therefor |
摘要 |
A plasma processing apparatus includes a plasma processing chamber (CN) having a plasma excitation electrode (4) for exciting a plasma, a radiofrequency generator (1) for supplying a radiofrequency voltage to the electrode, a radiofrequency feeder (3) connected to the electrode, and a matching circuit (2A) having an input end (PR3) and an output end (PR). The input end is connected to the radiofrequency generator and the output end is connected to an end of the radiofrequency feeder so as to achieve impedance matching between the plasma processing chamber and the radiofrequency generator. A frequency which is three times a first series resonant frequency f0 of the plasma processing chamber which is measured at the end of the radiofrequency feeder is larger than a power frequency fe of the radiofrequency waves. <IMAGE> |
申请公布号 |
EP1179834(A3) |
申请公布日期 |
2005.11.23 |
申请号 |
EP20010305941 |
申请日期 |
2001.07.10 |
申请人 |
ALPS ELECTRIC CO., LTD.;TADAHIRO OHMI |
发明人 |
NAKANO, AKIRA;OHMI, TADAHIRO |
分类号 |
H01L21/205;C23C16/509;C23C16/52;H01J37/32 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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