发明名称 |
Apparatus and method for generating high-order harmonic X-ray, and point-diffraction interferometer using high-order harmonic X-ray |
摘要 |
Disclosed herein is a point-diffraction interferometer which can inspect a surface quality of an optical system for extreme ultraviolet lithography using a high-order harmonic X-ray source with excellent coherence, and an apparatus and method for generating a high-order harmonic X-ray. The present invention uses a high-order harmonic X-ray beam as a coherence light source, thus remarkably reducing the size of an apparatus for generating a light source to approximately 1/100 of a device using a light source generated in a conventional synchrotron. Further, the present invention simplifies the construction of an interferometer by employing a thin foil in which a pinhole is formed through a drilling technique using high power femtosecond laser, thus increasing the industrial utility of the interferometer.
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申请公布号 |
US6968038(B2) |
申请公布日期 |
2005.11.22 |
申请号 |
US20030626748 |
申请日期 |
2003.07.22 |
申请人 |
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
NAM CHANG HEE;LEE DONG GUN |
分类号 |
G01B9/02;G01N23/20;G21K1/06;G21K5/02;H01S4/00;H05G1/00;H05G2/00;(IPC1-7):H01J35/32 |
主分类号 |
G01B9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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