ACRYLIC POLYMER CONTAINING GAP FILLER FORMING COMPOSITION FOR LITHOGRAPHY

摘要

A gap filler forming composition for lithography which is used in a dual damascene process for forming a gap filler having excellent planarization properties and filling properties is disclosed. Specifically, the gap filler forming composition is characterized by containing a polymer, a crosslinking agent, and a solvent and by being used in a semiconductor device production wherein a semiconductor substrate having a hole with an aspect ratio (height/diameter) of not less than 1 is covered with a photoresist and an image is transferred onto the semiconductor substrate by utilizing a lithography process.