发明名称 |
Method for the electron-microscopic observation of a semiconductor arrangement and apparatus therefor |
摘要 |
A method for the electron-microscopic observation of a semiconductor arrangement is provided. It includes providing an electron microscopy optics for imaging secondary electrons emanating from the semiconductor arrangement within an extended object field on a position-sensitive detector, providing an illumination device for emitting a primary energy beam, directing the primary energy beam to at least the object field for extracting there secondary electrons from the semiconductor arrangement. The semiconductor arrangement comprises a region with an upper surface provided by a first material and a recess with a high aspect ratio which is surrounded by the upper surface and has a bottom provided by a second material.
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申请公布号 |
US6967328(B2) |
申请公布日期 |
2005.11.22 |
申请号 |
US20030614825 |
申请日期 |
2003.07.09 |
申请人 |
CARL ZEISS NTS GMBH |
发明人 |
KIENZLE OLIVER;KNIPPELMEYER RAINER;MUELLER INGO |
分类号 |
H01L21/66;G01N23/00;G01N23/225;G01Q30/02;G01Q30/04;G21K7/00;H01J37/05;H01J37/244;H01J37/28;H01J37/29;(IPC1-7):G01N23/00 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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