发明名称 |
COMPOUND SEMICONDUCTOR ELEMENT AND PROCESS FOR FABRICATING THE SAME |
摘要 |
A compound semiconductor element comprising a heterojunction bipolar transistor having a compound semiconductor substrate and a sub-collector layer, a collector layer, a base layer and an emitter layer formed sequentially on that substrate as thin film crystal layers by vapor phase growth, wherein the base layer is a p-type compound semiconductor thin film containing C as dopant and the peak of an H-C a bonding mode C2-H is not detected in the measurement of infrared absorption at the room temperature.
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申请公布号 |
KR20050109509(A) |
申请公布日期 |
2005.11.21 |
申请号 |
KR20057015735 |
申请日期 |
2005.08.24 |
申请人 |
SUMITOMO CHEMICAL CO., LTD.;SUMIKA EPI SOLUTION COMPANY, LTD. |
发明人 |
YAMADA HISASHI;OSADA TAKENORI;FUKUHARA NOBORU |
分类号 |
H01L21/331;H01L29/737;(IPC1-7):H01L29/737 |
主分类号 |
H01L21/331 |
代理机构 |
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地址 |
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