发明名称 COMPOUND SEMICONDUCTOR ELEMENT AND PROCESS FOR FABRICATING THE SAME
摘要 A compound semiconductor element comprising a heterojunction bipolar transistor having a compound semiconductor substrate and a sub-collector layer, a collector layer, a base layer and an emitter layer formed sequentially on that substrate as thin film crystal layers by vapor phase growth, wherein the base layer is a p-type compound semiconductor thin film containing C as dopant and the peak of an H-C a bonding mode C2-H is not detected in the measurement of infrared absorption at the room temperature.
申请公布号 KR20050109509(A) 申请公布日期 2005.11.21
申请号 KR20057015735 申请日期 2005.08.24
申请人 SUMITOMO CHEMICAL CO., LTD.;SUMIKA EPI SOLUTION COMPANY, LTD. 发明人 YAMADA HISASHI;OSADA TAKENORI;FUKUHARA NOBORU
分类号 H01L21/331;H01L29/737;(IPC1-7):H01L29/737 主分类号 H01L21/331
代理机构 代理人
主权项
地址