发明名称 |
Gas blocker plate for improved deposition |
摘要 |
Embodiments of the present invention are directed to a blocker for a gas distribution system for use in semiconductor deposition apparatus. The gas distribution system includes a faceplate having a plurality of faceplate apertures to distribute a gas flow onto a surface of a substrate disposed downstream of the faceplate for film deposition on the substrate; and a blocker disposed upstream of the faceplate. The blocker includes a generally planar blocker surface facing the faceplate and a side wall disposed around a periphery of the blocker surface. The blocker surface includes a plurality of blocker holes to permit gas flow therethrough to the faceplate. The side wall is disposed near an edge of the faceplate and includes a plurality of side apertures to permit gas flow therethrough to the faceplate.
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申请公布号 |
US2005252447(A1) |
申请公布日期 |
2005.11.17 |
申请号 |
US20040843839 |
申请日期 |
2004.05.11 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ZHAO MAOSHENG;ROCHA-ALVAREZ JUAN C. |
分类号 |
C23C16/00;H01J37/32;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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