发明名称 |
METHOD AND APPARATUS OF DEPOSITING LOW TEMPERATURE INORGANIC FILMS ON PLASTIC SUBSTRATES |
摘要 |
A method and apparatus for depositing a low temperature inorganic film onto large area plastic substrates are described in this invention. Low temperature (<80°C) inorganic films do not adhere very well to the plastic substrate. Therefore, a low temperature (<80°C) plasma pre-treatment is added to improve the adhesion property. The inorganic film with plasma pre-treatment shows good adhesion and hermetic properties. |
申请公布号 |
WO2005108642(A1) |
申请公布日期 |
2005.11.17 |
申请号 |
WO2005US12810 |
申请日期 |
2005.04.14 |
申请人 |
APPLIED MATERIALS, INC.;HOU, LI;WON, TAE KYUNG |
发明人 |
HOU, LI;WON, TAE KYUNG |
分类号 |
C23C16/02;C23C16/30;C23C16/34;C23C16/40;C23C16/505;H01L51/52 |
主分类号 |
C23C16/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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