| 摘要 |
This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode assembly ( 2 ) where the material to be sputtered is located on a target ( 4 ) with a curved surface, the material to be sputtered being located, in particular, on the lateral surface of a cylinder, there being in a single coating chamber for a coherent coating zone at least three, preferably more, cathode assemblies ( 2 ) with rotatable, curved targets ( 4 ) positioned one beside the other.
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