| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing slurry for polishing metals that mainly consists of water and includes organic particles, an oxidant, and a complexing agent, and makes a rapid polishing while suppressing the occurrence of scratches, dishing, and erosion, and has suppressed foaming. <P>SOLUTION: The polishing slurry is used for polishing metals that contains the organic fine particles, the complexing agent, the oxidant, and an additive for suppressing foaming. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
