发明名称 GENERATION OF UNIFORMLY-DISTRIBUTED PLASMA
摘要 Methods and apparatus for generating uniformly-distributed plasma are described. A plasma generator according to the invention includes a cathode assembly (204) that is positioned adjacent to an anode (216) and forming a gap (220) there between. A gas source (228) supplies a volume of feed gas and/or a volume of excited atoms to the gap between the cathode assembly and the anode. A power supply (202) generates an electric field across the gap between the cathode assembly and the anode. The electric field ionizes the volume of feed gas and/or the volume of excited atoms that is supplied to the gap, thereby creating a plasma in the gap.
申请公布号 WO2004102610(A3) 申请公布日期 2005.11.17
申请号 WO2004US13053 申请日期 2004.04.27
申请人 ZOND, INC.;CHISTYAKOV, ROMAN 发明人 CHISTYAKOV, ROMAN
分类号 C23C14/34;C23C14/35;H01J37/32;H01J37/34 主分类号 C23C14/34
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