POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERN AND ELECTRONIC COMPONENT USING SAME

摘要

PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition developable with an alkali and having excellent transmittance for rays in the i-line region from a mercury lamp, preferable sensitivity, developing property and preferable resolution.

SOLUTION: The positive photosensitive resin composition comprises at least a polybenzoxazole precursor having a structural unit expressed by general formula (1) and a compound which produces an acid by irradiation with radiation. In formula (1), X represents a bivalent organic group and each of two R independently represents a hydrogen atom or monovalent organic group.

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