| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of lens capable of removing or reducing the waviness of a cycle of 1/10 to 1/2 of lens diameter. <P>SOLUTION: Substrate 1 is coated with resist 2 (a). Then, the resist 2 is irradiated with light through a gray scale mask 3 (b). The resist 2 is developed and a pattern of a micro lens array is formed on the resist 2 as shown in (c). Subsequently, the resist 2 and the substrate 1 are simultaneously dry-etched, the pattern of a microlens formed on the resist 2 is transferred to the substrate 1 and, thereby, the micro lens array is formed on the surface of the substrate 1. In the manufacturing method of lens, a process of heating the surface of the resist 2 which has a shape of the micro lens array formed in the process (c) into a prescribed temperature lower than the heat deformation temperature of the resist 2 is added. In such a manner, the resist is deformed while it is still in the solid state and the waviness of a cycle of 1/10 to 1/2 of lens diameter is removed or reduced. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
