发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To solve the problem that in fabrication of TFT that meets functions of various circuits, a structure of the TFT becomes complicated and consequently the number of steps is increased, which causes not only increase in production cost, but decrease in production yield. SOLUTION: An impurity having high concentration is added into a semiconductor layer using a resist having a tapered shape used in the preparation of a gate electrode having the tapered shape and a gate electrode having the tapered shape as masks, and then the gate electrode having the tapered shape is etched in a vertical direction using the resist as a mask, and an impurity having low concentration is added into a semiconductor layer below the tapered portion of the gate electrode removed in this way. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005322896(A) 申请公布日期 2005.11.17
申请号 JP20050107064 申请日期 2005.04.04
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 OKAMOTO SATORU
分类号 H01L21/28;H01L21/3205;H01L21/336;H01L23/52;H01L29/423;H01L29/49;H01L29/786;(IPC1-7):H01L21/336;H01L21/320 主分类号 H01L21/28
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