发明名称 Illumination optical system, exposure device using the illumination optical system, and exposure method
摘要 In an illumination optical system constituted to uniformize the intensity distribution of illumination light by use of an optical integrator, the overall length thereof is shortened. The illumination optical system includes: a light source including a laser irradiating illumination light on an illuminated body such as a two-dimensional SLM and an optical integrator; the optical integrator being placed between this light source and the illuminated body and uniformizes the intensity distribution of the illumination light by passing the light through minute cells. In this system, the size of the minute cell of the optical integrator (S 1= S 2 ) is 1.5 mm or less.
申请公布号 US2005254034(A1) 申请公布日期 2005.11.17
申请号 US20050187998 申请日期 2005.07.25
申请人 FUJI PHOTO FILM CO., LTD. 发明人 OHMORI TOSHIHIKO;ISHIKAWA HIROMI
分类号 G02B27/09;(IPC1-7):G03B27/54 主分类号 G02B27/09
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