| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve a transcribing accuracy by regulating the temperature of a mask efficiently, and by preventing the mask from the distortion caused by its thermal expansion, in an exposure apparatus so interrupted from the outside air as to perform its exposure processing under the condition of a fixed atmospheric pressure. <P>SOLUTION: In a charged-particle-beam or optical exposure apparatus, a temperature regulating plane having a controlled temperature is so disposed closely to the principal or rear surface of a mask, and a temperature regulating gas is so fed from a gas feeding portion provided in the central portion of the temperature regulating plane to the fine clearance between the mask surface and the plane as to exhaust the gas by using a plurality of disposal exhausting portions surrounding the gas feeding portion, and as to perform the temperature regulation of the mask efficiently and stably. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
