| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner capable of exposure with high alignment precision. <P>SOLUTION: This aligner comprises an exposure illumination optical system for illuminating a negative plate with predetermined exposure light; a projection optical system for projecting the pattern on the negative plate onto a substrate; and a position detection means for performing position detection with light having a wavelength substantially same as that of the exposure light via the projection optical system. The detection range of the position detection means is made to be the range wherein the precision is assured by the aberration of the projection optical system. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
