METHOD FOR CLEANING THIN-FILM FORMING APPARATUS

摘要

Disclosed is a method for cleaning a thin-film forming apparatus wherein a thin film is formed on an object to be processed by supplying a process gas into a reaction chamber in which the object is housed. The cleaning method comprises a purging step for purging the inside of the reaction chamber by supplying an activatable nitrogenous gas containing nitrogen into the reaction chamber. The purging step comprises a substep wherein the nitrogenous gas is activated for nitriding the surfaces of members within the reaction chamber.