| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photographic sensitive material which suppresses sublimation of a sublimable material in heat development, is excellent in stability in long-term operation of a heat developing apparatus, and has improved moisture resistance. SOLUTION: In the heat developable photographic sensitive material having on a support a photosensitive layer containing organic silver salt particles, silver halide grains and a reducing agent, an amount of an organic acid sublimed at 120°C is 0.1-10.0 mg/m<SP>2</SP>and an outermost layer on the photosensitive layer side is a barrier layer consisting of a latex and a wax emulsion. COPYRIGHT: (C)2006,JPO&NCIPI
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