发明名称 Plasma-assisted gas production
摘要 Methods and apparatus are provided for plasma-assisted gas production. In one embodiment, a gas, which includes at least one atomic or molecular species, can flow into a cavity ( 305 ). The gas can be subjected to electromagnetic radiation having a frequency less than about 333 GHz (optionally in the presence of a plasma catalyst) such that a plasma ( 310 ) forms in the cavity ( 305 ). A filter ( 315 ) capable of passing the atomic or molecular species, but preventing others from passing, can be in fluid communication with the cavity ( 305 ). In this way, the selected species can be extracted and collected, for storage or immediate use.
申请公布号 US2005253529(A1) 申请公布日期 2005.11.17
申请号 US20050513220 申请日期 2005.06.29
申请人 KUMAR SATYENDRA;KUMAR DEVENDRA 发明人 KUMAR SATYENDRA;KUMAR DEVENDRA
分类号 B01J19/08;B01J19/12;C01B3/34;H01J7/24;H05H1/24;(IPC1-7):H01J7/24 主分类号 B01J19/08
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