发明名称 MOS transistor and a semiconductor integrated circuit apparatus having the same
摘要 A MOS transistor comprises: a first conduction type region; a second conduction type drain region formed on the outermost layer portion of the first conduction type region; a second conduction type source region formed on the outermost layer portion of the first conduction type region with a channel region provided between the second conduction type drain region and the second conduction type source region; agate electrode formed on the channel region; a second conduction type base region formed inside of the second conduction type drain region in plan elevation; a plurality of first conduction type emitter regions formed in the second conduction type base region on the outermost layer portion thereof at spatial intervals in a predetermined direction; and a drain contact connected to, as lying astride, adjacent two first conduction type emitter regions and that portion of the second conduction type drain region between these adjacent two first conduction type emitter regions.
申请公布号 US2005253174(A1) 申请公布日期 2005.11.17
申请号 US20050116357 申请日期 2005.04.28
申请人 SAKURAGI MASAHIRO;SONODA MASAHIKO 发明人 SAKURAGI MASAHIRO;SONODA MASAHIKO
分类号 H01L27/04;H01L21/822;H01L27/06;H01L29/06;H01L29/10;H01L29/76;H01L29/78;(IPC1-7):H01L29/76 主分类号 H01L27/04
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