发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus includes an instrument for determining the radiation intensity distribution at a pupil plane of the projection system while a patterning device is imparting the projection beam with a pattern, a calculation apparatus for calculating the effect on the imaging by the projection system of heating resulting from the projection beam in the projection system having the determined intensity distribution and a controller for adjusting the lithographic apparatus to compensate for the calculated effect of heating.
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申请公布号 |
US2005254024(A1) |
申请公布日期 |
2005.11.17 |
申请号 |
US20040842634 |
申请日期 |
2004.05.11 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MARIE VAN GREEVENBROEK HENDRIKUS R.;LUDOVICUS VAN DIJCK HENDRIKUS A.;WAGNER CHRISTIAN;JORRITSMA LAURENTIUS C. |
分类号 |
G03F7/20;G03B27/52;H01L21/027;(IPC1-7):G03B27/52 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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