Adjusting mechanical, optical and/or electrical properties of a layer comprises sputtering in a vacuum chamber, injecting energy in pulse form and periodically changing the pulse packets with respect to the electrode

摘要

Process for adjusting mechanical, optical and/or electrical properties of a layer which is deposited by reactive sputtering of a target on an object comprises sputtering in a vacuum chamber containing a reactive gas and a carrier gas using two magnetron electrodes, injecting energy in pulse form in the frequency region of 50 Hz to 100 kHz and periodically changing the pulse packets with respect to the magnetron electrode.