| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide the design method of a resist molecule for improving transparency of fluororesin resist in 157 nm lithography. <P>SOLUTION: The structure of a model molecule is determined where a frame of fluorine content resin is extracted, and a fluorine substitution model molecule is determined as obtained by substituting a hydrogen atom combined to the model molecule for a fluorine atom. A molecule orbit factor is calculated for fluorine substitution model molecule by using a molecule orbit method. A minimum excitation energy value is calculated from the molecule orbit factor obtained by a mentioned process. Absorption is evaluated in a vacuum ultraviolet light region of the fluorine substitution model molecule from the minimum excitation energy value. Thus, the molecule of fluororesin resist is designed. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
