| 摘要 |
PROBLEM TO BE SOLVED: To provide a Co alloy target material which inhibits the variation of a soft magnetic film to be formed when being sputtered, and reduces particles to be produced when being sputtered, and to provide a manufacturing method therefor. SOLUTION: A Co alloy target comprising 1 to 10 atomic% of Zr and 1 to 10 atomic% of Nb and/or Ta, the balance being unavoidable impurities and Co, is produced by rapidly solidifying a melt of the Co alloy to produce an alloy powder, classifying the alloy powder to maximum particle size of 500μm or less, and pressure-sintering the classified alloy powder. COPYRIGHT: (C)2006,JPO&NCIPI
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