METHOD AND APPARATUS FOR FORMING COMBINATORIAL FILM

摘要

A combinatorial film forming method for coating a substrate placed in a vacuum with a thin film, characterized in that two or more substrates can be moved to a film forming position or a cooling position, and a film is formed in a single evacuation process after varying the film forming conditions by moving only the substrate to be coated sequentially to the film forming position while cooling the substrate at the cooling position through a cooling mechanism. The coating film can be produced efficiently under different film forming conditions by controlling various film forming conditions exactly in, e.g., sputtering. Its apparatus is also disclosed.