发明名称 TEMPERATURE RESISTANT HERMETIC SEALING FORMED AT LOW TEMPERATURES FOR MEMS PACKAGES
摘要 <p>Certain hermetically sealed devices, such as micro-­electromechanical systems (MEMS), may be sensitive high processing temperatures. However, the seal should be able to withstand higher temperatures that may be encountered, for example during device operation. Hermetic sealing may be realized by a fluxless soldering approach that comprises solder combinations that contain a low-melting-point (LMP) component such as Indium (In) or Tin (Sn) and a high-melting-point (HMP) component such as gold (Au), silver (Ag), or copper (Cu). The LMP/HMP ratio is selected to be HMP component rich so that the LMP component is essentially depleted resulting in an intermetallic compound (IMC) that has a higher melting point than the original HMP/LMP processing temperature after bonding and thermal annealing.</p>
申请公布号 WO2005108283(A1) 申请公布日期 2005.11.17
申请号 WO2005US12086 申请日期 2005.04.08
申请人 INTEL CORPORATION;LU, DAOQIANG;HECK, JOHN 发明人 LU, DAOQIANG;HECK, JOHN
分类号 H01L23/10;B81B7/00;(IPC1-7):B81B7/00 主分类号 H01L23/10
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