发明名称 |
Imaging and devices in lithography |
摘要 |
Systems and techniques for lithography. In one aspect, a method includes producing a microelectronic device by modulating an intensity and a phase of the zero diffraction order of a radiation with a device including subwavelength features having a pitch dimension smaller than one wavelength of the radiation.
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申请公布号 |
US2005255388(A1) |
申请公布日期 |
2005.11.17 |
申请号 |
US20040846403 |
申请日期 |
2004.05.14 |
申请人 |
INTEL CORPORATION |
发明人 |
TEJNIL EDITA;BORODOVSKY YAN |
分类号 |
G03F1/00;G03F1/14;(IPC1-7):G03F9/00;G06F17/50 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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