发明名称 High integrity sputtering target material and method for producing bulk quantities of same
摘要 A method of making metal plates as well as sputtering targets is described. In addition, products made by the process of the present invention are further described. The present invention preferably provides a product with reduced or minimized marbleizing on the surface of the metal product which has a multitude of benefits.
申请公布号 US2005252268(A1) 申请公布日期 2005.11.17
申请号 US20050036759 申请日期 2005.01.14
申请人 MICHALUK CHRISTOPHER A;HUBER LOUIS E JR;ALEXANDER P T;CARPENTER CRAIG M 发明人 MICHALUK CHRISTOPHER A.;HUBER LOUIS E.JR.;ALEXANDER P. T.;CARPENTER CRAIG M.
分类号 B21B23/00;C22F1/00;C22F1/18;C23C14/34;(IPC1-7):B21B23/00 主分类号 B21B23/00
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