| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition method and a vapor deposition equipment where, in vapor deposition for an organic compound, bumping and the change of an evaporation rate are prevented, and evaporation is performed at a fixed evaporation rate stably for a long period of time. SOLUTION: In the vapor deposition equipment for an organic compound composed of a heating vessel with a deep bottom charged with an organic compound and a heater for heating the heating vessel from the side faces and vaporizing or subliming the organic compound, columns each composed of a stock having satisfactory thermal conductivity and standing vertically to the evaporation face of the organic compound are arranged in the heating vessel. COPYRIGHT: (C)2006,JPO&NCIPI
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