| 摘要 |
PROBLEM TO BE SOLVED: To provide a large-size high-temperature vacuum chamber apparatus, satisfying all requirements in view that it is required that vacuum degree and temperature in a working area quickly arrives at desired values in order to efficiently treat a large substance to be treated, in which it is required that temperature distribution in the working area can maintain uniformness during working and heat irradiation efficiency to an object to be treated such as a glass substrate can maintain unison in all positions of front and rear ends, left and right ends and a central part of the substrate in an apparatus for treating a product having a large dimension. SOLUTION: The high-temperature chamber apparatus is provided with a heating means inside in order to heat-treat the object to be treated such as the glass substrate and is constituted by mutually joining a plurality of separatable chamber elements formed by dividing the chamber apparatus in the shape of round slice. COPYRIGHT: (C)2006,JPO&NCIPI
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