发明名称 SUBSTRATE DOME
摘要 PROBLEM TO BE SOLVED: To inhibit a film formed on a substrate arranged on a substrate dome from forming non-uniform thickness distribution, due to thermal expansion and centrifugal force by rotation, which come out during forming the film in the substrate dome. SOLUTION: A vacuum device consists of a vacuum chamber, and a substrate dome which mounts a substrate to be film-formed thereon and is arranged so as to face the bottom of the vacuum chamber, wherein the substrate dome is formed of titanium or a titanium alloy. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005320605(A) 申请公布日期 2005.11.17
申请号 JP20040141101 申请日期 2004.05.11
申请人 SHOWA SHINKU:KK 发明人 TAKIMOTO MASAYUKI;KOMURO HIROYUKI;ABE TATSUYA;FUSE YUTAKA;AONAHATA KAZUHITO
分类号 C23C14/24;C23C14/04;C23C14/50;(IPC1-7):C23C14/24 主分类号 C23C14/24
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