发明名称 |
Method and equipment for detecting pattern defect |
摘要 |
An Inspection apparatus and method includes utilizing a laser source which emits an ultraviolet laser beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer and an objective lens for illuminating a specimen with a polarization condition controlled and coherency reduced ultraviolet laser beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the ultraviolet laser beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
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申请公布号 |
US2005253081(A1) |
申请公布日期 |
2005.11.17 |
申请号 |
US20050184981 |
申请日期 |
2005.07.20 |
申请人 |
SHISHIDO HIROAKI;YOSHITAKE YASUHIRO;NAKATA TOSHIHIKO;MAEDA SHUNJI;YOSHIDA MINORU;UTO SACHIO |
发明人 |
SHISHIDO HIROAKI;YOSHITAKE YASUHIRO;NAKATA TOSHIHIKO;MAEDA SHUNJI;YOSHIDA MINORU;UTO SACHIO |
分类号 |
G01N21/00;G01N21/88;G01N21/95;G01N21/956;G02B5/09;G02B26/12;(IPC1-7):G01N21/00 |
主分类号 |
G01N21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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