METAL ETCHING METHOD FOR AN INTERCONNECT STRUCTURE AND METAL INTERCONNECT STRUCTURE OBTAINED BY SUCH METHOD

摘要

A metal interconnects structure, comprises a substrate (11), a dielectric layer (12) lying above the substrate, a stop layer (13) for metal etching lying above the dielectric layer, a metal layer (15′) lying above the stop layer, said metal layer being patterned according to a desired pattern.