Chuck, Lithographic Projection Apparatus, Method of Manufacturing a Chuck and Device Manufacturing Method

摘要

A lithographic projection apparatus with a chuck in which a dielectric element of the electrostatic chuck has a specific resistivity of at least 10<16> OMEGA cm so that once the potential difference between electrodes of the chuck is removed the force on the article to be clamped reduces below a predetermined minimum level quickly. The dielectric element also has a coefficient of thermal expansion of less than 0.02 x 10<-6>K<-1>. A method of manufacturing a chuck comprising the step of joining a first glass ceramic element with a second glass ceramic element with an electrode sandwiched therebetween in which a current is passed through the second glass element is also disclosed.