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发明名称
METHOD OF FORMING A Ta2O5 COMPRISING LAYER
摘要
申请公布号
EP1595005(A1)
申请公布日期
2005.11.16
申请号
EP20040707748
申请日期
2004.02.03
申请人
MICRON TECHNOLOGY, INC.
发明人
VAARTSTRA, BRIAN, A.;DOAN, TRUNG, TRI
分类号
C23C16/40;C23C16/44;C23C16/455;C23C16/511;(IPC1-7):C23C16/40
主分类号
C23C16/40
代理机构
代理人
主权项
地址
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