发明名称 Main electron lens for an electron gun
摘要 <p>The invention relates to a main electron lens for an inline electron gun, comprising a first, focusing electrode (G8) and a second, accelerating electrode (G9) which are equipped with optical plates (1, 2), each provided with a central hole (4, 7) and with two outer holes (3, 5 and 6, 8). The first optical plate (1) is placed at a first distance (L1) from the aperture (9) of the first electrode (G8) and the second optical plate (2) is placed at a second distance (L2) from the aperture (10) of the second electrode (G9). The ratio of the first and second distances (L1/L2) is determined by the formula: &lt;DF&gt;L1/L2 = A11( delta Vd)&lt;2&gt; + A1 delta Vd + A0 + C0 x Bias &lt;/DF&gt; in which: A11, A1, A0 and C0 are constants; delta Vd is the variation in the focus voltage that it is desired for the system to have; and Bias is the bias that it is desired for the system to have. &lt;??&gt;Application: Cathode-ray tubes.</p>
申请公布号 EP1596414(A1) 申请公布日期 2005.11.16
申请号 EP20050103601 申请日期 2005.04.29
申请人 THOMSON LICENSING 发明人 GUEUGNON, NICOLAS;RICHARD, NICOLAS;GISSOT, GREGOIRE;BIZOT, PIERRE
分类号 H01J29/50;H01J29/48;(IPC1-7):H01J29/50 主分类号 H01J29/50
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