发明名称 Transistor with variable electron affinity gate and methods of fabrication and use
摘要 A CMOS-compatible FET has a reduced electron affinity polycrystalline or microcrystalline SiC gate that is electrically isolated (floating) or interconnected. The SiC material composition is selected to establish the barrier energy between the SiC gate and a gate insulator. In a memory application, such as a flash EEPROM, the SiC composition is selected to establish a lower barrier energy to reduce write and erase voltages and times or accommodate the particular data charge retention time needed for the particular application. In a light detector or imaging application, the SiC composition is selected to provide sensitivity to the desired wavelength of light. Unlike conventional photodetectors, light is absorbed in the floating gate, thereby ejecting previously stored electrons therefrom. Also unlike conventional photodetectors, the light detector according to the present invention is actually more sensitive to lower energy photons as the semiconductor bandgap is increased.
申请公布号 US6965123(B1) 申请公布日期 2005.11.15
申请号 US20000691004 申请日期 2000.10.18
申请人 MICRON TECHNOLOGY, INC. 发明人 FORBES LEONARD;AHN KIE Y.
分类号 H01L21/28;H01L29/423;H01L29/49;(IPC1-7):H01L29/78;H01L29/788;H01L31/031;H01L31/10 主分类号 H01L21/28
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