发明名称 Method and system for processing stability of semiconductor devices
摘要 A method and system for processing stability of semiconductor devices. The method includes providing a first plurality of semiconductor devices, providing a second plurality of semiconductor devices, obtaining a first plurality of measured values corresponding to a characteristic, and obtaining a second plurality of measured values corresponding to the characteristic. Additionally, the method includes performing a first statistical analysis for the first plurality of measured values, determining a first statistical distribution, performing a second statistical analysis for the second plurality of measured values, and determining a second statistical distribution. Moreover, the method includes processing information associated with the first statistical distribution and the second statistical distribution, and determining an indicator. Also, the method includes processing information associated with the indicator, determining a confidence level, processing information associated with the confidence level, and determining whether the characteristic is stable.
申请公布号 US6965844(B1) 申请公布日期 2005.11.15
申请号 US20040880761 申请日期 2004.06.29
申请人 SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION 发明人 WANG EUGENE;NI JINGHUA
分类号 G06K9/00;H01L21/66;(IPC1-7):G06K9/00 主分类号 G06K9/00
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