发明名称 |
PHOTORESIST RESIN COMPOSITION |
摘要 |
The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble compound, d) a photopolymerization initiator and e) a solvent, and a photoresist dry film resists using the photoresist resins. The photoresist resin compositions and the photoresist dry film resists using the same in accordance with the invention have excellent adhesion to a substrate and sandblast resistance and at the same time, they have high sensitivity as well as high resolution, thereby enabling fine pattern formation on substrates. |
申请公布号 |
KR20050107121(A) |
申请公布日期 |
2005.11.11 |
申请号 |
KR20040032321 |
申请日期 |
2004.05.07 |
申请人 |
DONGJIN SEMICHEM CO., LTD. |
发明人 |
KIM, BONG GI;RYU, SUNG MUN;PARK, SEONG MO;PARK, CHAN SEOK |
分类号 |
G03F7/027;G03C1/492;G03F7/004;G03F7/029;G03F7/038;G03F7/11;H01J9/02;H01J11/22;H01J11/34;H01J11/36;(IPC1-7):G03F7/027 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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