发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, COMPUTER PROGRAM, AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To improve throughput when, in a coating and development apparatus, transfers of substrates positioned in each modules are shared by a plurality of substrate transferring means, referring a transfer schedule where its transfer cycle is arranged in series of time, and one turn is controlled to be shifted to the next module in order. SOLUTION: After one substrate transferring means completes its self-sharing transfer in one transfer cycle, forecasting the transfer schedule, the substrate transferring means waits in front of the top module of the self-shared transfer in the next transfer cycle. Thus, each cycles can be quickly carried out. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005317913(A) 申请公布日期 2005.11.10
申请号 JP20040381538 申请日期 2004.12.28
申请人 TOKYO ELECTRON LTD 发明人 AZUMA MAKIO;MIYATA AKIRA
分类号 H01L21/677;H01L21/02;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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