发明名称 EXPOSURE METHOD AND APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To increase the life time of an exposure light source and to prolong the period in the exchange cycle to reduce the cost in an exposure method for exposing, by an exposing unit having a plurality of exposure head lines arranged in the sub scanning direction. <P>SOLUTION: Irradiation with exposure light or stopping irradiation by the unit of an exposure head line 163a or 163b can be performed, by controlling the drive of a laser module emitting the exposure light; and the driving of the laser module is controlled, in such a manner that if the irradiation range of the exposed light by the head line 163b is not located on a photosensitive material 150, irradiation with the exposure light by the exposure head line 163b is stopped. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005316269(A) 申请公布日期 2005.11.10
申请号 JP20040135893 申请日期 2004.04.30
申请人 FUJI PHOTO FILM CO LTD 发明人 HASHIGUCHI AKIHIRO
分类号 G03F7/20;B41J2/435;B41J2/465;H01J33/00 主分类号 G03F7/20
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